TFE Plasma Chemical Vapor Deposition/Single-Zone PE-CVD System
Product features
⚫ High performance RF power supply makes the plasma more stable
⚫ The rail type structure makes the whole reaction chamber situated in the glow generating area and realize quick heating and cooling
⚫ Compared to traditional CVDs, this system has a lower growth temperature
Technical parameters
| Item/Model | TFE-1200-50-I-220 |
| Maximum temperature | 1,150 ℃ (short-term) |
| Rated temperature | 1,100 ℃ |
| Recommended heating rate | ≤10 ℃/min |
| Control precision | ±1 ℃ |
| Size of furnace tube | φ30/50/60*1200 mm |
| Size of furnace chamber | φ80*220 mm |
| Heating zone length | 220 mm |
| Constant temperature zone length | 80 mm |
| Heating element | High quality domestic resistance wire |
| Rated power | 3 KW |
| Gas supply system | Three-way high precision MFC with a range of 0-500sccm (customizable) |
| RF power supply | RF power: 5-500 W; RF frequency: 13.56 MHz; matching mode: automatic matching |
| Vacuum system | Dual stage rotary vane vacuum pump (other pumps such as diffusion pump and molecular pump are customizable) |
| Outline dimension | 1250*510*810 mm |
