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TFE Plasma Chemical Vapor Deposition/Single-Zone PE-CVD System

TFE Plasma Chemical Vapor Deposition/Single-Zone PE-CVD System
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Product Details

TFE Plasma Chemical Vapor Deposition/Single-Zone PE-CVD System


Product features 

⚫ High performance RF power supply makes the plasma more stable 

⚫ The rail type structure makes the whole reaction chamber situated in the glow generating area and realize quick heating and cooling 

⚫ Compared to traditional CVDs, this system has a lower growth temperature


Technical parameters

Item/ModelTFE-1200-50-I-220
Maximum temperature1,150 ℃ (short-term)
Rated temperature1,100 ℃
Recommended heating rate≤10 ℃/min
Control precision±1 ℃
Size of furnace tubeφ30/50/60*1200 mm
Size of furnace chamberφ80*220 mm
Heating zone length220 mm
Constant temperature zone length80 mm
Heating elementHigh quality domestic resistance wire
Rated power3 KW
Gas supply systemThree-way high precision MFC with a range of 0-500sccm (customizable)
RF power supplyRF power: 5-500 W; RF frequency: 13.56 MHz; matching mode: automatic matching
Vacuum systemDual stage rotary vane vacuum pump (other pumps such as diffusion pump and molecular pump are customizable)
Outline dimension1250*510*810 mm